Electron and Ion Beam Characterization

Electron and ion beams are widely used for both qualitative and quantitative analysis of semiconductor materials and devices. They can be used to image structures with sub-nm resolution and to provide information about elemental composition and dopant concentration. This course describes the fundamentals of electron and ion beam characterization and includes a project that analyzes the surface roughness of a solar cell.

• Explain the interaction of electron and ion beams with semiconductor materials.
• Describe the constituent components of electron and ion beam characterization systems.
• Describe applications of electron and ion beam characterization.